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钼及钼合金溅射靶材的研究现状与发展趋势

Research status and development trend of molybdenum and molybdenum alloy sputtering target materials

  • 摘要: 钼及钼合金具有熔点高、导电导热性好、热膨胀系数低、耐腐蚀性能好及环境友好等优点,利用钼及钼合金加工制备的溅射靶材已广泛应用于电子电器、太阳能电池及玻璃镀膜等领域。本文介绍了对钼及钼合金溅射靶材的基本要求及制备方法,系统综述了目前国内外对钼、钼钛、钼钠、钼铌合金靶材的研究现状,并对钼及钼合金溅射靶材未来的发展趋势进行了展望。

     

    Abstract: Molybdenum and molybdenum alloy sputtering target materials have been widely used in the fields of electronic industry, solar cell, and glass coating because of their high melting point, good thermal and electric conductivity, low thermal expansion coefficient, good corrosion resistance, and environmentally friendly performance. The basic requirements and preparing methods were introduced in this paper firstly. The main research status of Mo, Mo-Ti, Mo-Na, and Mo-Nb at home and abroad was systematically reviewed, and the development trend of molybdenum and molybdenum alloy sputtering target materials was presented.

     

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