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钯/多孔钽/钽复合膜的制备及表征

Preparation and characterization of Pd/porous Ta/Ta composite membrane

  • 摘要: 本文为了促进金属钽在电子、军工、医疗器械、航空航天和化工领域的应用,采用喷涂-烧结的工艺在钽箔表面获得了一层多孔钽膜;接着以多孔钽/钽为基体,采用化学镀钯的工艺获得了钯/多孔钽/钽复合膜。表面形貌测试结果表面,烧结温度对多孔钽膜的结构具有显著的影响,1700℃烧结两小时,可获得烧结颈发育良好的多孔钽膜。化学镀时间对多孔钽膜表面的钯膜具有显著的影响,且由于多孔钽膜表面结构复杂,不易在多孔钽表面获得均匀、致密的钯膜。

     

    Abstract: In order to promote the application of metal tantalum(Ta) in the fields of electronics, military, medical devices, aerospace and chemical engineering, the porous Tamembrane was prepared on the surface of Ta foil by the process of spraying combine sintering.Subsequently, the composite membrane(Pd/porousTa/Ta) was prepared by electroless Pd plating processeswhich using porous Ta/Ta as the composite substrate. The surface morphology shows that the sintering temperature has a significant impact on the structure of porous Tamembrane. The porous Ta membrane with well-developed sintering neck can be obtained after sintering at 1700oC for 2 hours.The electroless plating time has a significant effect on the Pdmembrane on the surface of porous Tamembrane. Due to the complex surface structure of porous Tamembrane,causedit was difficult to obtain uniform and dense Pdmembrane on the surface of porous Tamembrane..

     

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