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钯/多孔钽/钽复合膜的制备及表征

Preparation and characterization of Pd/porous Ta/Ta composite membrane

  • 摘要: 通过喷涂-烧结工艺在钽箔表面获得了一层多孔钽膜,以多孔钽/钽为基体,采用化学镀钯工艺获得了钯/多孔钽/钽复合膜,研究了烧结温度对多孔钽膜形貌的影响,并分析了钯膜的生长行为。结果表明,烧结温度对多孔钽膜的结构具有显著影响,1700 ℃烧结2 h可获得烧结颈发育良好的多孔钽膜。化学镀时间对多孔钽膜表面的钯膜具有显著的影响,且由于多孔钽膜表面结构复杂,不易在多孔钽表面获得均匀、致密的钯膜。

     

    Abstract: The porous Ta membrane was prepared on the surface of Ta foils by spraying and sintering. Subsequently, the Pd/porousTa/Ta composite membrane was prepared by electroless Pd plating processes using the porous Ta/Ta as the composite substrate. The effect of sintering temperature on the morphology of porous tantalum films was studied, and the growth behavior of Pd films was analyzed. In the results, the sintering temperature has a significant impact on the structure of porous Ta membrane. The porous Ta membrane with the well-developed sintering neck can be obtained by sintering at 1700 ℃ for 2 h. The electroless plating time has a significant effect on the Pd membrane on the surface of porous Ta membrane. Moreover, due to the complex surface structure of porous Ta membrane, it is difficult to obtain the uniform and dense Pd membrane on the surface of porous Ta membrane.

     

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