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熔池结构对选区激光熔化316L不锈钢腐蚀行为作用机理

Mechanism of melt pool structure on corrosion behavior of selective laser melted 316L stainless steels

  • 摘要: 熔池结构是激光增材制造的一个重要特征,同时也是引起选区激光熔化316L不锈钢垂直加工方向(XOY面)和平行加工方向(XOZ面)的组织结构和性能差异的重要原因。本文研究了熔池结构对选区激光熔化316L不锈钢腐蚀行为的作用机理,通过扫描电子显微镜、电子背散射衍射仪、透射电子显微镜等设备,从不同尺度探究XOY面和XOZ面上熔池结构的差异,并利用电化学测试和浸泡试验研究了XOY面和XOZ面的钝化行为和点蚀行为。结果表明,XOY面上熔池结构沿着加工路径连续分布,熔池内部存在等轴/近等轴胞状亚结构;XOZ面上的熔池结构呈现连续鱼鳞状,熔池内部的胞状结构具有明显的取向性。在0.5 mol/L H2SO4溶液中恒电位成膜后,XOY面钝化膜上氧空位缺陷密度更小,电化学阻抗值更大,Cr2O3相对含量更高,表现出比XOZ面具有更加优异的钝化行为;在酸性FeCl3溶液中浸泡12 h后,XOZ面上的最大点蚀坑深度为447.4 μm,约为XOY面的2倍,此外XOZ面圆形点蚀坑的边缘区域能够观察到点蚀坑延扇形熔池边界扩展的趋势。综合可知,XOY面上小尺寸的胞状亚结构促进钝化膜的生长,而XOZ面上的扇形熔池边界能够加速点蚀的扩展过程。

     

    Abstract: The melt pool structure represents a critical feature in laser additive manufacturing and serves as a primary factor contributing to the disparities in microstructure and performance between the vertical (XOY) and horizontal (XOZ) processing directions of 316L stainless steels fabricated via selective laser melting (SLM). The mechanism of molten pool structure on the corrosion behavior of 316L stainless steels fabricated by SLM was investigated in this study. The differences in molten pool structure on the XOY and XOZ planes were explored by scanning electron microscope (SEM), electron back scattering diffraction, (EBSD), and transmission electron microscope (TEM) in various scales. The electrochemical testing and immersion experiments were conducted to study the differences in passivation and pitting behavior between the XOY and XOZ planes. The results show that the molten pool structure on the XOY plane is continuously distributed along the processing path, with equiaxed or near-equiaxed cellular substructures within the molten pool. In contrast, the molten pool structure on the XOZ plane exhibits a continuous fish-scale pattern, with the cellular structure displaying clear orientation. After forming a film at a constant potential in 0.5 mol/L H2SO4 solution, the XOY plane exhibits a passivation film with lower defect density of oxygen vacancy, higher electrochemical impedance, and higher relative content of Cr2O3, compared to the XOZ plane, indicating the superior passivation behavior on the XOY plane. After immersion for 12 h in acidic FeCl3 solution, the maximum pitting depth on the XOZ plane is 447.4 μm, approximately twice than that of the XOY plane. Additionally, the edges of the circular pitting pits on the XOZ plane show the tendency to extend into a fan-shaped molten pool boundary. It can be comprehensively known that the smaller cellular substructure on the XOY plane facilitates the passivation film growth, while the fan-shaped molten pool boundary on the XOZ plane accelerates the pitting expansion.

     

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