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CHEN Yan-fang, XIE Jing-pei, WANG Ai-qin, MA Dou-qin, YANG Kang, GUO Hui-dan. Research status and development trend of molybdenum and molybdenum alloy sputtering target materials[J]. Powder Metallurgy Technology, 2018, 36(5): 393-398. DOI: 10.19591/j.cnki.cn11-1974/tf.2018.05.013
Citation: CHEN Yan-fang, XIE Jing-pei, WANG Ai-qin, MA Dou-qin, YANG Kang, GUO Hui-dan. Research status and development trend of molybdenum and molybdenum alloy sputtering target materials[J]. Powder Metallurgy Technology, 2018, 36(5): 393-398. DOI: 10.19591/j.cnki.cn11-1974/tf.2018.05.013

Research status and development trend of molybdenum and molybdenum alloy sputtering target materials

  • Molybdenum and molybdenum alloy sputtering target materials have been widely used in the fields of electronic industry, solar cell, and glass coating because of their high melting point, good thermal and electric conductivity, low thermal expansion coefficient, good corrosion resistance, and environmentally friendly performance. The basic requirements and preparing methods were introduced in this paper firstly. The main research status of Mo, Mo-Ti, Mo-Na, and Mo-Nb at home and abroad was systematically reviewed, and the development trend of molybdenum and molybdenum alloy sputtering target materials was presented.
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