Preparation and characterization of spherical tantalum powder by radio frequency plasma
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摘要: 采用射频等离子体对不规则状冶金级钽粉进行了球化处理, 研究了粉末供给速率对球化率的影响。结果表明, 当粉末供给速率为10 g·min-1时, 钽粉的球化率可到90%以上; 球化后的钽粉球形度良好、表面光洁, 内部无空心缺陷, 流动性为13.84[s·(50 g)-1], 松装密度从5.87 g/cm3增加到9.35 g/cm3, 达到了增材制造技术的要求; 球化后的粉末杂质元素含量和物相组成没有发生变化。Abstract: Spherical tantalum powders were fabricated by radio frequency (RF) plasma spheroidization process, the effect of powder feeding rate on the spheroidization efficiency was investigated. The results indicate that, the spheroidization efficiency can be above 90% as the powder feeding rate is 10 g·min-1; the obtained tantalum powders after spheroidization exhibit the good sphericity, smooth surface, and narrow size distribution without the internal hollow defects; the flowability of the obtained tantalum powders increases to 13.83[s·(50 g)-1], and the apparent density increases from 5.87 g/cm3 to 9.35 g/cm3, meeting the requirements of additive manufacturing technology; the impurity content and phase composition of tantalum powders after spheroidization remain unchanged.
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Key words:
- additive manufacturing /
- tantalum powders /
- radio frequency plasma /
- spheroidization
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图 1 等离子球化装置结构原理图
Figure 1. Schematic illustration of the radio frequency (RF) plasma spheroidization process
图 2 不同供给速率球化后钽粉的微观形貌：（a）原始钽粉；（b）10 g·min-1；（c）20 g·min-1；（d）30 g·min-1；（e）40 g·min-1；（f）50 g·min-1
Figure 2. SEM images of the spheroidized tantalum powders at different feeding rates: (a) raw powders; (b) 10 g·min-1; (c) 20 g·min-1; (d) 30 g·min-1; (e) 40 g·min-1; (f) 50 g·min-1
图 3 粉末供给速率对钽粉球化率的影响
Figure 3. Influence of feeding rate on the spheroidization efficiency of tantalum powders
图 4 粉末供给速率对钽粉流动性和松装密度的影响
Figure 4. Influence of feeding rate on the flowability and apparent density of tantalum powders
图 5 球化前后钽粉粒度分布
Figure 5. Particle size distributions of tantalum powder before and after spheroidization
图 6 球化前后钽粉X射线衍射图
Figure 6. X-ray diffraction patterns of tantalum powders before and after spheroidization
图 7 球化后粉末的表面（a）及截面（b）显微形貌图
Figure 7. Surface (a) and cross (b) section SEM images of tantalum powders after spheroidization
表 1 射频等离子球化钽粉的工艺参数
Table 1. Processing parameters for RF plasma processing
中央气体流量(Argon) / (L·min-1) 载气流量(Helium) / (L·min-1) 鞘气流量(Argon) / (L·min-1) 等离子体功率/ kW 反应压力/ kPa 22 18 57 40 10~15 
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表 2 球化前后钽粉杂质元素质量分数
Table 2. Chemical compositions of impurity elements in tantalum powders before and after spheroidization
元素 C / ×10-6 O / ×10-6 N / ×10-6 H / ×10-6 球化前 12 620 49 27 球化后 13 680 48 28
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